Advanced Energy Introduces 401M Mid-Infrared Pyrometer for Precise Semiconductor Process Control
Fast, Accurate, and Customizable Temperature Measurement for Advanced Epitaxy and Deposition Applications
Advanced Energy has unveiled the 401M mid-infrared optical pyrometer, a next-generation sensor designed for high-precision, non-contact temperature measurement in semiconductor and industrial process environments.
Unmatched Accuracy and Speed
With response times as low as 1 microsecond and accuracy within ±3 °C, the 401M enables real-time closed-loop temperature control across a wide range of 50 °C to 1,300 °C. Its mid-infrared technology allows reliable measurement through transparent surfaces and outside the process chamber - ideal for lamp-heated epitaxy, CVD, and thin-film glass coating processes, where traditional near-infrared pyrometers fall short.
Designed for Advanced Semiconductor Environments
The 401M supports interference-free temperature monitoring, enhancing process consistency and yield. With built-in EtherCAT® communication, it eliminates external modules, simplifies integration, and reduces potential failure points.
Customizable options, including measurement wavelength, temperature range, working distance, and spot size, ensure adaptability to various deposition systems and materials. The device is also backwards compatible with the existing OR400M platform, providing a cost-effective upgrade path.
Key Benefits at a Glance
- Real-time closed-loop temperature control
- ±3 °C accuracy and microsecond-level response
- EtherCAT® connectivity for simplified integration
- Customizable design for multiple process environments
- Backwards compatible with OR400M
Interested in Advanced Energy’s sensing and control solutions? Contact FORTEC Switzerland – we’ll help you find the right solution for your advanced process requirements.